高架輪廓(點擊將開啟燈箱)
作品圖片 高架輪廓(點擊將開啟燈箱)
作品圖片 高架輪廓(點擊將開啟燈箱)
高架輪廓 Elevated Contour line
作者 丘智偉 Author CHIU Chih-Wei
年份 2024 Year 2024
媒材 攝影相紙輸出裱框、玻璃噴砂 Medium Photographic print, mounted and framed, sandblasted glass
尺寸 50 × 70 cm（三聯幅） Size 50 × 70 cm（三聯幅）
作品賞析 Artwork Appreciation
〈高架輪廓〉以不同時段的天空攝影作為基底，呈現高架視角下被提升後的日常視野。覆蓋其上的玻璃以手繪線條描繪高架建設的形狀，並透過噴砂處理留下霧化的結構痕跡。影像、玻璃與質地之間的層層疊加，回應城市在高架化進程中不斷變動的景觀，以及高度改變所帶來的觀看轉換。作品希望讓觀者在這些被提升的視線與結構之間，感受城市形貌在持續更新中的細微變化。
“Elevated Contour line” is based on photographs of the sky taken at different times of day, presenting an everyday view seen from an elevated perspective. The glass layered above is inscribed with hand-drawn lines that trace the forms of elevated infrastructure, while sandblasting leaves behind softened, mist-like structural marks. Through the layering of image, glass, and texture, the work responds to the constantly shifting urban landscape shaped by elevation and infrastructural development, and to the changing viewpoints brought about by height. It invites viewers to sense the subtle transformations of the city as it continues to evolve between these raised sightlines and structures.
